The College of Continuing Education and Community Service at the University of Hawaii at Hilo is offering the following workshops and classes in March.
The College of Continuing Education and Community Service at the University of Hawaii at Hilo is offering the following workshops and classes in March.
For more information or to register, contact CCECS at 974-7664 or email ccecs@hawaii.edu.
Technology and Ethics in Social Work Practice
Where: UH-Hilo UCB Room 100
When: 1-4 p.m. Monday, March 7
Cost: $45
Details: This workshop is geared toward social workers at all levels of experience and licensure who are interested in the discussion of how ethics and technology intersect.
Participants will apply the NASW Code of Ethics to practice situations and discuss implications that technology has on practice.
The workshop will review NASW and ASWB’s Standards for Technology and Social Work Practice as well as ASWB’s Model Regulatory Standards for Technology and Social Work Practice.
There also will be discussion on risk management strategies.
For social workers licensed in Hawaii, this workshop has been designed to meet the ethics requirement set out in the Hawaii Revised Statues.
The workshop is taught by Robin Arndt, instructor at the UH-Manoa Myron B. Thompson School of Social Work.
Job Searching Skills for Individuals with Employment Barriers
Where: UH-Hilo Science and Technology Building, Room 226
When: 9 a.m. Saturday, March 12
Cost: $35
Details: Some of the topics include interviewing skills, the resume, how to prepare for the background check in advance and the best ways to let the employer know about mandated meetings, classes or health-related issues that might require employees to leave the work site.
Taught by Jeani Navarro, who has more than 20 years of experience in career development and training.
Intermediate Photoshop
Where: UH-Hilo SeniorNet Computer Lab, PB 7
When: 4:30 p.m. March 21
Cost: $75
Details: Explore more advanced photo manipulation features such as levels adjustments and the histogram, layers, filters, advanced selection methods, layer masks and adjustment layers as a means of improving your images.